This page contains links to current and past projects by the Computational Optical and Discharge Physics Group. The presentations are in PDF format. You can obtain Acrobat Reader for PDF files from .

• 2-dimensional Modeling of Pulsed Inductively Coupled Plasmas [New! Pramod Subramonium (26 August 2003)]

• Non-equilibrium Ion and Neutral Transport in Low-pressure Plasma Processing Reactors [New! Vivek Vyas (26 August 2003)]

• Coulomb Crystals in Plasma Processing Reactors [New! Vivek Vyas (26 August 2003)]

• Global Modeling of Singlet-Delta Oxygen Production in Glow Discharges with Application to Oxygen-Iodine Lasers [New! D. Shane Stafford (26 August 2003)]

• Startup Processes in Metal Halide Lamps [New! Ananth Bhoj (26 August 2003)]

• Radiation Trapping in Electrodeless Lamps [New! Kapil Rajaraman (26 August 2003)]

• Harmonic Content of Electron Impact Source Functions in Inductively Coupled Plasmas using an "On-the-Fly" Monte Carlo Technique [New! Arvind Sankaran (26 August 2003)]

• Integrated Modeling: Etching and Post-processing of Porous and Conventional SiO₂ in Fluorocarbon Plasmas [New! Arvind Sankaran (26 August 2003)]

• Hybrid Plasma Equipment Model: Inductively Coupled Plasma Etching Reactors

• Consequences of Asymmetric Pumping in an ICP Reactor

• Plasma Chemistry Monte Carlo Module

• Monte Carlo Feature Profile Model

• Studies in Nonlinear Plasma-Circuit Interaction

• Feedback Control of RF Plasma Processing Reactors (Updated 9/30/98)

• A Plasma Display Panel Simulation Code (Updated 9/30/98)

• Simulations of Remote AR/O₂ and AR/N₂ Plasmas for Oxide Growth and Interface Treatments

• Studies of Electron Cyclotron Resonance (ECR) Devices Sustained by Azimuthal Microwave TE(0,n) Mode Fields

• Magnetron Ionized Metal Physical Vapor Deposition

• Plasma Remediation of Greenhouse Gases in Semiconductor Processing

• Plasma Remediation of Toxic Gases in DBDs

• Plasma Transport Around Complex Dust Agglomerates

• Simulation of PECVD of SiO₂ Film on Plastic Tubes

• Surface Reaction Modeling in Plasma Deposition and Etching Processing

• 3-Dimensional Plasma Equipment Simulation Using a New Ambipolar Accleration Technique